Abstract

Journal Article Staining Block Copolymers using Sequential Infiltration Synthesis for High Contrast Imaging and STEM tomography Get access T Segal-Peretz, T Segal-Peretz Institute for Molecular Engineering, University of Chicago, Chicago, USAMaterials Science Division, Argonne National Laboratory, Argonne, USA Search for other works by this author on: Oxford Academic Google Scholar J Winterstein, J Winterstein Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, USA Search for other works by this author on: Oxford Academic Google Scholar M Biswas, M Biswas Energy Systems Division, Argonne National Laboratory, Argonne, USA Search for other works by this author on: Oxford Academic Google Scholar JA Liddle, JA Liddle Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, USA Search for other works by this author on: Oxford Academic Google Scholar Jeffrey W Elam, Jeffrey W Elam Energy Systems Division, Argonne National Laboratory, Argonne, USA Search for other works by this author on: Oxford Academic Google Scholar N J Zaluzec, N J Zaluzec Electron Microscopy Center, NST Division, Argonne National Laboratory, Argonne, USA Search for other works by this author on: Oxford Academic Google Scholar PF Nealey PF Nealey Institute for Molecular Engineering, University of Chicago, Chicago, USAMaterials Science Division, Argonne National Laboratory, Argonne, USA Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 21, Issue S3, 1 August 2015, Pages 611–612, https://doi.org/10.1017/S1431927615003852 Published: 23 September 2015

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