Abstract
International Journal of Computational Engineering ScienceVol. 04, No. 03, pp. 521-524 (2003) MaterialsNo AccessSPUTTERED SILICON DIOXIDE FILMS FOR MEMS APPLICATIONSUDHIR CHANDRA, VIVEKANAND BHATT, and SHRAWAN K. JHASUDHIR CHANDRACentre for Applied Research in Electronics, Indian Institute of Technology, Delhi, Hauz-Khas, New Delhi 110016, India Search for more papers by this author , VIVEKANAND BHATTCentre for Applied Research in Electronics, Indian Institute of Technology, Delhi, Hauz-Khas, New Delhi 110016, India Search for more papers by this author , and SHRAWAN K. JHACentre for Applied Research in Electronics, Indian Institute of Technology, Delhi, Hauz-Khas, New Delhi 110016, India Search for more papers by this author https://doi.org/10.1142/S1465876303001666Cited by:1 PreviousNext AboutSectionsPDF/EPUB ToolsAdd to favoritesDownload CitationsTrack CitationsRecommend to Library ShareShare onFacebookTwitterLinked InRedditEmail AbstractIn this paper, we report the sputtering of SiO2 as a viable low temperature process for MEMS applications. Very homogenous films were prepared on Si substrate using RF diode sputtering of SiO2 target in argon atmosphere. The effect of target to substrate spacing, sputtering pressure, RF power, and substrate cooling were investigated. The IR transmission spectra and etch rate of silicon dioxide in buffered hydrofluoric acid were measured and these were compared with those of thermally grown silicon dioxide. Microstructures of sputtered SiO2 film were fabricated using bulk micromachining process. The use of positive photoresist as sacrificial layer in surface micromachining technology was explored. The substrate heating was found to be the limiting factor for high rate sputter deposition.Keywords:Sputtered SiO2 filmsSputtering for MEMSMicromachiningMicrostructure References L. Maissel and R. Glang , Handbook of Thin Film Technology ( McGraw-Hill, Inc. , 1970 ) . Google Scholar Ljubisa Ristic , Sensor Technology and Devices ( Artech House, Inc. , 1994 ) . Google ScholarJ. Santamariaet al., Thin Solid Films 125, 299 (1985). Crossref, Google Scholar FiguresReferencesRelatedDetailsCited By 1Feasibility study of RF sputtered ZnO film for surface micromachiningVivekanand Bhatt, Prem Pal and Sudhir Chandra1 Aug 2005 | Surface and Coatings Technology, Vol. 198, No. 1-3 Recommended Vol. 04, No. 03 Metrics History KeywordsSputtered SiO2 filmsSputtering for MEMSMicromachiningMicrostructurePDF download
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