Abstract
The intermediate and quasi-equilibrium contours generated by ion bombardment on silica targets under the condition of stationary target and ion beam direction are shown predictable by Frank's construction method. An expression based on ion reflection is reported which yields values for the apex angle of conical silica ion etch structures in agreement with those derived graphically from sputter yield data. The effect of the initial target shape on the etch topography is discussed.
Full Text
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call