Abstract

A compact electron storage ring provides a bright, stable and reliable source of extreme ultraviolet (EUV) radiation for metrology applications in semiconductor industry. The COSAMI concept (COmpact Synchrotron for Actinic Mass Inspection) applied design principles and technology of modern diffraction limited light source storage rings to an EUV facility operating at 13.5 nm wavelength. Since floor space is an important issue in an industrial environment, we propose a lattice configuration where three (or more) recirculation turns are stacked vertically. We present a facility, called Spiral-COSAMI, which simultaneously serves multiple (three or more) EUV beamlines within about the same floor space of the original COSAMI, and using the same type of injector and the same set of diagnostics, radio-frequency and pulsed magnet devices. The increased period of revolution of the multiple turns mitigates the problem of ion trapping and relaxes specifications of injection kickers.

Highlights

  • COSAMI, a compact light source for actinic mask inspection with ptychography in the extreme ultraviolet (EUV) wavelength range has been presented in [1,2,3]

  • The coupling is created in the inclined half rings of the transfer paths and the return path

  • A high degree of coupling compensation is reached for μx/2π = 2.731 and μy/2π = 0.323

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Summary

Introduction

COSAMI, a compact light source for actinic mask inspection with ptychography in the extreme ultraviolet (EUV) wavelength range has been presented in [1,2,3]. The resulting difficulties, due to the lower vertical gap of an undulator and the corresponding reduction of the beam lifetime, is solved by implementing top-up injection from a full energy booster synchrotron. This in turn provides the intensity stability of the electron beam which is required for actinic mask inspection with Ptychography. For Spiral COSAMI on the other hand, for the same duty cycle a much longer gap is available which enhances the clearing efficiency This concept could be applied to any other compact source for which a small floor space is required and with different undulator types in the various loops. The number of loops could be reduced or extended

Basic layout for a spiral compact source with 3 undulators
Minimization of the transverse coupling
Optics of half arcs for minimum coupling
Spiral storage ring optics
Dynamic aperture
Beam lifetime
Injection
Magnets
RF-system
10. Conclusions
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