Spintronic device in SWCNT-FET configuration based on chromium oxides thin films consisting of half-metallic ferromagnetic CrO2

Abstract

Spintronic device architectures consisting of ferromagnetic chromium oxide electrodes in single-walled carbon nanotubes field effect transistor (SWCNT-FET) configuration have been fabricated to act as strategic building blocks for next generation super-compact high-speed nanoelectronic devices for logic and memory operations. Stable thin films of chromium oxides consisting of half-metallic ferromagnetic chromium-di-oxide (CrO2) were pulsed laser deposited (PLD) over lattice-matched rutile-type-tetragonal intermediate TiO2 thin layers over thermally oxidized Si substrates for engineering of the spintronic device structure. Focused ion beam (FIB) milling was applied to the ferromagnetic chromium oxide thin films for patterning of the source (S) and (D) electrodes. Typical electrical characteristics derived by lnρ vs. T−1/2 plots confirmed spin-dependent transport (SDT) as the dominant mechanism of electrical conduction upto temperatures of ∼280 K along with negative magnetoresistance (MR) of ∼30 % at 278 K. Electrical characteristics (output and transfer) of the spintronic device structure were drawn under application of magnetic field (H) in out-of-plane geometry at the temperatures of 5.6 K, 250 K & 300 K. Drain current (Id) is demonstrated to be controlled effectively as a function of gate bias (Vg) for different fixed Vd-biases at all the device operating temperatures. Change in %MR as a function of gate voltage (Vg) was acquired at T = 250 &T = 300 K that displayed higher %MR change under out-of-plane geometry of applied field of 0.75 T of the spintronic device operation.