Abstract
We introduce a new class of spin-on dopants composed of organic, dopant-containing polymers. These new dopants offer a hybrid between conventional inorganic spin-on dopants and a recently developed organic monolayer doping technique that affords unprecedented control and uniformity of doping profiles. We demonstrate the ability of polymer film doping to achieve both p-type and n-type silicon by using boron- and phosphorus-containing polymer films. Different doping mechanisms are observed for boron and phosphorus doping, which could be related to the specific chemistries of the polymers. Thus, there is an opportunity to further control doping in the future by tuning the polymer chemistry.
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