Abstract

Abstract Transparent ZnO layers were prepared on silica glass substrates by the spin coating-pyrolysis process. As-deposited films were pre-fired at 250 °C for 60 min, at 350 °C for 30 min, and at 500 °C for 10 min, followed by heat treatment at 900 °C for 30 min in air. The ZnO films were analyzed by high resolution X-ray diffraction, field emission-scanning electron microscopy, scanning probe microscopy, and ultraviolet–visible–near infrared spectrophotometry. (0 0 2)-oriented ZnO films were obtained by pre-firing at 350 °C and at 500 °C. All the ZnO films exhibited a high transmittance, above 80%, in the visible region, and showed a sharp fundamental absorption edge at 0.38–0.40 μm. The most highly c -axis-oriented ZnO with a homogeneous surface was observed at a pyrolysis temperature of 350 °C.

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