Abstract
The stripping of photoresists from a silicon wafer using an rf oxygen plasma has been monitored using the optical emission from electronically excited OH and CO species in the ultraviolet region of the spectrum. The band systems at 283.0 nm (CO*, OH*), 297.7 nm (CO*), and 308.9 nm (OH*) are intense and spectrally isolated from other systems and arise from plasma-induced oxidation of the polymeric photoresist material. The endpoint of plasma stripping and the amount of stripped material is easily determined quantitatively. In addition, variations in stripping rate of photoresist as a function of wafer position in the reaction chamber can be detected.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.