Abstract
AbstractIn this paper, measurement of various plasma parameters during pulsed laser deposition of ZnO thin films on Si (100) substrates is reported. The variations of electron number density and electron temperature with ambient pressure and target substrate distance is obtained via spectroscopic measurements. The structural and optical properties of ZnO thin films were analyzed using X-ray diffraction, scanning electron microscope, and photoluminescence and then correlated with spectroscopic results to find optimum conditions for the deposition of high quality ZnO thin films.
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