Spectroscopic ellipsometry analysis of nanocrystalline silicon carbide obtained at low temperature

Abstract

Thin films of silicon carbide obtained by hydrogen-reactive magnetron sputtering with various substrate temperatures T S (100–600 °C) were analysed by transmission electron microscopy (TEM) and spectroscopic ellipsometry (SE). The TEM images show evidence of the growth of hydrogenated nanocrystalline silicon carbide (nc-SiC:H) deposited at T S as low as 300 °C, with an average grain size of 4–5 nm. The SE spectra were reproduced by using the Forouhi–Bloomer model and assuming a 7 nm thick overlayer with a void fraction of 45%. The observed increase of the refractive index with T S is assigned to the improvement of both crystallinity and compactness of the layer. The expected increase of the optical gap seems to be offset by the drop of hydrogen content, leaving the gap unchanged. The fabrication and characteristics of nc-SiC:H/c-Si diode are finally described and the data indicate a good rectifying behaviour, together with a low leakage current.