Vertical Alignment of Nematic Liquid Crystal by Rubbing-Free Method on the SiC Thin Film Layer

Abstract

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of the silicon carbide (SiC) thin film. The SiC thin film exhibits good chemical and thermal stability. The good thermal and chemical stability make SiC an attractive candidate for electronic applications. A vertical alignment of nematic liquid crystal by atomic beam exposure on the SiC thin film surface was achieved. The about 87° of stable pretilt angle was achieved at the range from 30 to 45° of incident angle. The good LC alignment is maintained by the atomic beam alignment method on the SiC thin film surface until annealing temperature of 300 °C. Consequently, the vertical alignment effect of liquid crystal and the good thermal stability by the atomic beam alignment method on the SiC thin film layer can be achieved.