Abstract
Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.
Highlights
Most progress in modern science relies on observing and manipulating matter at the molecular or atomic scale
Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range
Significant progress is made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response
Summary
Most progress in modern science relies on observing and manipulating matter at the molecular or atomic scale. Driven by demanding applications like EUV photo-lithography, accelerator based XUV sources, astronomy telescopes, and soft x-ray microscopy, tremendous progress of the multilayer technology has been achieved during the last three decades. Both high reflectance and flexible spectral response were realized for different wavelength regions. To support some advanced XUV applications, spectral properties, including broadband response, high spectral resolution, mitigation of out-of-band (OoB) spectral components, etc., are required. These can involve the need for a particular polarization or phase characteristics. This paper will discuss the recent progress of multilayer optics with tailored spectral properties that can strongly promote the development of many EUV and soft x-ray applications
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