Abstract
Abstract The Si L 2,3 -spectra of thin films of transition d-metal (TM) silicides (d-silicides) obtained by the ultrasoft X-ray emission spectroscopy (USXES) method have been analyzed on the basis of our d–s,p resonance model. Different stoichiometric composition silicides were obtained depending on the annealing conditions of heterostructures TM/Si mono TM/SiO 2 /Si mono. Compared with the spectra of the bulk samples, Si L 2,3 -spectra of thin film silicides demonstrate an increased intensity in the high energy range near the Fermi level. The unique sharp intensive peak of the Si s-state at the Fermi level is a consequence of the distinction of d–s resonance in NiSi 2 .
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