Abstract
Protective oxide coatings, such as Al2O3 and Y2O3 coatings, are widely used in semiconductor industries because of their hardness, high wear resistance, dielectric strength, high corrosion resistance, and chemical stability for plasma chambers [...]
Highlights
The functional oxide crystal has several favorable properties, including good transparency, high conductivity, a wide bandgap, and strong luminescence
Thin-film oxide materials have been grown on various substrates by hydrothermal, sol–gel, chemical bath deposition, sputtering, atomic layer deposition, pulsed laser deposition, chemical vapor deposition (CVD), hot filament CVD, plasma-enhanced CVD, etc
A number of breakthroughs over the past few years have driven an exponential energy in the research activity of this field. This Special Issue on Functional Oxide-Based Thin-Film Materials aims at gathering together some of the specialists working with device applications, to shed light on the properties and behavior of thin-film oxides
Summary
The functional oxide crystal has several favorable properties, including good transparency, high conductivity, a wide bandgap, and strong luminescence. Thin-film oxide materials have been grown on various substrates by hydrothermal, sol–gel, chemical bath deposition, sputtering, atomic layer deposition, pulsed laser deposition, chemical vapor deposition (CVD), hot filament CVD, plasma-enhanced CVD, etc. This Special Issue on Functional Oxide-Based Thin-Film Materials aims at gathering together some of the specialists working with device applications, to shed light on the properties and behavior of thin-film oxides.
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