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Abstract
Fast air printing of functional oxide films: spatial atomic layer deposition, a new technique with a high potential in the field of low cost photovoltaics.
Highlights
A new approach to atomic layer deposition (ALD) has been developed that doesn't require vacuum and is much faster than conventional ALD
In our lab we have been using/ developing a novel atmospheric Spatial ALD (SALD) system to fabricate active components for new generation solar cells, showing the potential of this novel technique for the fabrication of high quality materials that can be integrated into devices
The burst of nanoscience and nanotechnology in the last decades has brought an associated boom of ALD popularity, since it allows the nanoengineering of surfaces with precise nanoscale control
Summary
Are very small; (ii) simpler designs which are compatible with roll-to-roll processing; (iii) the possibility of using gas-bearings.[22] several patents on close-proximity SALD were led from 2008 to 2011,22 Levy et al from Kodak were the rst ones to present and publish their results on the deposition of ZnO thin lm transistors, showing the suitability of SALD for fabricating device components.[31] Later Poodt et al demonstrated high quality Al2O3 lms obtained by SALD The rst theoretical[42,43,44] and kinetic[45,46] studies on SALD have been published in just the last months and reports evaluating the effect of deposition conditions on the properties of SALD ZnO and Al2O3 were published recently.[47,48,49] To date, Al2O3, Cu2O, TiO2 and ZnO (including doping such as Al:ZnO, Mg:ZnO and ZnO:N) have already been
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