Abstract
We demonstrate the solid-phase epitaxial crystallization of thin films of lithium tantalate deposited on lithium niobate and sapphire substrates. An organometallic compound, formed by reaction of lithium dipivaloylmethanate and tantalum(V) ethoxide, is used as a single-source precursor for the deposition of amorphous thin films of lithium tantalate using a spray-metalorganic chemical vapor deposition process. Annealing of the amorphous films results in their epitaxial alignment with respect to the underlying LiNbO3 or Al2O3 substrates. X-ray diffraction, ion channeling, and scanning electron microscopy are used to evaluate and compare the crystalline quality of the films produced by this solid-phase epitaxial process to films that are crystalline as deposited.
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