Abstract
Textured copper films of thickness 0.5 to 10 μm have been produced in a planar magnetron by sputtering copper onto room temperature glass substrates at various argon pressures in the range 0.5–100 Pa. Surface morphology, solar absorptance and infrared emittance depend markedly on deposition conditions. The dominant surface topographical feature of thick films is an array of cones. Possible mechanism accounting for the variation of surface topography with the experimental parameters are discussed. Textured copper films have been used as the basis of a selective surface, incorporating a homogeneous metal carbide interface layer, which exhibits excellent stability at temperatures up to 450°C in vacuum.
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