Abstract

A new soft-x-ray multilayer monochromator with an improved resolution and a low specular background is presented. The principles of the device, based on the use of a lamellar multilayer amplitude grating (LMAG), are summarized. The techniques of fabrication of the monochromator (multilayer deposition, UV lithography and reactive ion etching) are given. The performance of this new monochromator at photon energies around 1500 eV is demonstrated. Copyright © 2001 John Wiley & Sons, Ltd.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.