Soft thermal nanoimprint with a 10 nm feature size.

Abstract

Nanoimprinting with rigid molds offers almost unlimited pattern resolution, but it suffers from high sensitivity to defects, and is limited to pattering flat surfaces. These limitations can be addressed by nanoimprinting with soft molds. However, soft molds have been used so far with UV resists, and could not achieve a resolution and minimal feature size comparable to those of rigid molds. Here, we explore the miniaturization edge of soft nanoimprint molds, and demonstrate their compatibility with thermal imprint resists. To that end, we produced a pattern with 10 nm critical dimensions, using electron beam lithography, and used it to replicate nanoimprint molds by direct casting of an elastomer onto the patterned resist. We showed that the produced pattern can be faithfully transferred from the mold by thermal nanoimprinting. In addition, we showed that similar nanoimprint molds can also be produced by double replication, which includes nanoimprinting of a thermal resist with an ultrahigh resolution rigid mold, and replication of a soft mold from the imprint pattern. We also demonstrated our novel nanoimprinting approach in two unconventional applications: nanopatterning of a thermal resist on a lens surface, and direct nanoimprinting of chalcogenide glass. Our novel nanoimprint approach pushes the envelope of standard nanofabrication, and demonstrates its potential for numerous applications impossible up to now.