Abstract
HfxCo100−x thin films (in the atomic weight range of x = 30–36) were growth on Si (100) substrates by direct current (DC) magnetron sputtering method. Thin films produced with atomic compositions in this context depicted the amorphous structure. The films revealed soft magnetic properties and thus exhibited very low hysteresis along the hard-axis direction. Magnetic measurements indicated that Hf35Co65 thin film has the maximum saturation magnetization (1491 emu cm−3) at 300 K. Additionally, magnetization measurements show an increase in saturation magnetization value from 981 to 1491 emu cm−3 when the value of x varies between 30 and 35. The influence of varying sputtering pressure and film composition on soft magnetic properties are investigated and discussed in the present paper.
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