Abstract
Sm17(Co1−xNix)83 (at. %, x = 0, 0.2, 0.8, and 1) alloy thin films are deposited on Cr(100) single-crystal underlayers at temperatures ranging between 100 and 500 °C by molecular beam epitaxy. The effects of substrate temperature and Ni/Co composition on the film growth behavior and the detailed resulting structure are investigated. Formation of epitaxial RT5 (R: rare earth metal, T: transition metal) ordered crystals is, respectively, recognized for the films with x of 0, 0.2, 0.8, and 1 deposited at temperatures higher than 400, 400, 300, and 300 °C, whereas the films deposited below the respective temperatures consist of amorphous phases. The order degree increases with increasing the substrate temperature and the Ni content. The order degrees of films with x of 0, 0.2, 0.8, and 1 deposited at 500 °C are 0.6, 0.7, 0.8, and 0.9, respectively. A replacement of Co site in SmCo5 structure with Ni atom is useful for enhancing the formation of RT5 ordered phase.
Published Version
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