Abstract

As a non-volatile memory, zero-dimensional quantum dot resistive random access memory (RRAM) has shown broad application prospects in the field of intelligent electronic devices due to its advantages of simple structure, low switching voltage, fast response speed, high storage density, and low power consumption. Tin dioxide quantum dots (SnO<sub>2</sub> QDs) are a good option for resistive functional materials with excellent physical and chemical stabilities, high electron mobilities, and adjustable energy band structures. In this paper, the SnO<sub>2</sub> QDs with sizes of 2.51 nm, 2.96 nm and 3.53 nm are prepared by the solvothermal method, and the quantum size effect is observed in a small size range and the effective regulation of resistive switching voltage is achieved based on its quantum size effect, which is the unique advantage of quantum dot material in comparison with that of bulk material. Research result shows that as the size of SnO<sub>2</sub> QD increases, the SET/RESET voltage gradually decreases from –3.18 V/4.35 V to –2.02 V/3.08 V. The 3.53 nm SnO<sub>2</sub> QDs have lower SET/RESET voltage (–2.02 V/3.08 V) and larger resistive switching ratio (> 10<sup>4</sup>), and the resistive switching performance of the device has changed less than 5% after having experienced durability tests 2 × 10<sup>4</sup> times, showing good stability and retention. Besides, according to the fitting of charge transport mechanism, SnO<sub>2</sub> QD RRAM exhibits Ohmic conduction under LRS, while Ohmic conduction, thermionic emission and space charge limit current work together during HRS. The resistive switching effect of SnO<sub>2</sub> QDs is controlled by trap filled limit current and interface Schottky Barrier modulation; the trapping/de-trapping behavior of internal defect potential well of SnO<sub>2</sub> QDs on electrons dominates the HRS/LRS switching, while the effective control of ITO/SnO<sub>2</sub> QDs and SnO<sub>2</sub> QDs/Au interface Schottky barrier is the key to accurately regulating the switching voltage. The reason why SnO<sub>2</sub> QD RRAM exhibits good size-switching voltage dependence is that the larger SnO<sub>2</sub> QD has lower Fermi level and interface Schottky barrier height, so the junction resistance voltage division is reduced, and the SET/RESET voltage decrease accordingly. This work reveals the huge application potential and commercial application value of SnO<sub>2</sub> QDs in the field of resistive switching memory, and provides a new option for the development of RRAM.

Highlights

  • 3.53 nm are prepared by the solvothermal method

  • the quantum size effect is observed in a small size range

  • the effective regulation of resistive switching voltage is achieved based on its quantum size effect

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Summary

Chen Wen

单根SnO2纳米线器件的电输运性能及其机理研究 Electrical transport properties and related mechanism of single SnO2 nanowire device 物理学报. 与此相比, 量子点 (quantum dots, QDs) 的合成方法更加简单, 特有的库仑阻塞 效应与量子遂穿效应 [8,9] 可实现对注入电荷的自俘 获, 从而展示出更小的器件尺寸, 更低的开关电压 和更快的响应速度, 成为下一代 RRAM 的发展趋 势 [10,11]. 此外, SnO2 QDs 离子间较高的结合能使得 其相较于其他无机量子点材料具有更佳的物理化 学稳定性, 是阻变功能材料的良好选择 [21,22]. 本文采用剂热法制备了多种尺寸的 SnO2 QDs, 验证其量子尺寸效应, 并将其用作阻变材料制备了 全无机 SnO2 QDs RRAM. 以 10000 r/min, 5 min 沉淀离心, 得到黄棕色的 SnO2 QDs, 将其分散在辛硫醇 (C8H18S, 纯度 99%) 中封 装待用. 量取 50 μL SnO2 QDs 溶液以 2000 r/min 的转速在 ITO 基底上旋涂 30 s 成膜, 随 后在 120 °C 下退火 10 min 以去除有机溶剂. 使 用 ultraviolet photoelectron spectroscopy (UPS) 价带谱测试了不同尺寸 SnO2 QDs 的能带 结构, 结果见图 2(a)—图 2(c) 所示, 插图为对应的

Sn M
Cycle stability tests
Findings
RESET process
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