Abstract
Molybdenum disulfide (MoS2) has attracted great attention because of its unique physical properties and wide potential applications in electronic, optoelectronic devices. Chemical vapor deposition (CVD) turned out to be a powerful tool for producing MoS2 thin layers. Nonetheless, how the concentration of vapor-phase precursor influences the size and shape change of MoS2 is not clearly understood yet. In this work, we designed a gradient of sulfur (S) concentration during CVD growth of MoS2 to investigate how S concentration affects its size and shape change. The shape of MoS2 film changes from triangle to hexagon, then back to triangle as S concentration decreases. We also analyzed the uniformity and crystal quality of the CVD-grown MoS2 by using optical microscopy, Raman, photoluminescence (PL), circularly polarized PL, and atomic force microscopy.
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