Abstract
Heterojunction bipolar transistors are desirable for microwave applications because a low base resistance can be achieved yielding high maximum frequency of oscillation. Here we report Si/Si/sub 1-x/Ge/sub x/ heterojunction bipolar transistors with high breakdown voltages and excellent small-signal microwave characteristics. The transistors structures were grown by molecular beam epitaxy and fabricated by a double-mesa process. Measured f/sub T/ and f/sub max/ were 10 and 22 GHz, respectively, for transistors with BV/sub CBO/ of 40 V.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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