Abstract
The low-voltage in-lens FE-SEM can observe a 10nm diameter pinhole on Si polycrystal film and etch residue which cannot be observed by a typical SEM. However,this in-lens SEM cannot observe a large size specimen such as a wafer. A new single pole objective lens was recently designed for this purpose. Because of the small bore diameter (2∼3mm),when using this lens,a negative potential must be given to the specimen holder to improve the efficiency of the secondary electron detection.From researching of a single pole magnetic lens system used for observing a wafer with high resolution, we obtained the secondary electron image. Fig.1 shows the single pole objective lens mounted on the specimen chamber. L is the distance between the pole face and the opposite iron wall,R is the radius of the outer yoke,and WD is the working distance. The design features are as follows:
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