Abstract
Current and next-generation light sources, for instance third generation synchrotron sources, FLASH and the future project X-FEL require single-layer and multilayer mirrors with an active optical length of more than one meter. At the GKSS research centre, a new sputtering system for the deposition of single-layer and multilayers has been installed. This new system is able to manufacture mirrors with a maximum deposition length of 1.5m. In this paper we are going to present the first results of this challenging system. The mirror properties are investigated by means of X-ray reflectometry, transmission electron microscopy and interference microscopy. The performance of the mirrors is analyzed, considering X-ray reflectivity, film thickness, micro-roughness and the uniformity of these properties over the whole deposition length. The results will be discussed and compared with former results.
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