Abstract

Recent work on fabricating metal-insulator-metal (MIM) single electron transistors (SETs) using deposited dielectrics shows promise for becoming a manufacturable process due to compatibility with modern CMOS processes. This process, the “rib-SET” process [V. Joshi, A. O. Orlov, and G. L. Snider, J. Vac. Sci. Technol. B 26, 2587 (2008); G. Karbasian, A. O. Orlov, and G. L. Snider, J. Vac. Sci. Technol. B 33 (2015)], features a self-aligned island and should allow for scaling SETs below 10 nm. However, one of the biggest roadblocks in realizing a high-quality SET with this process has been difficulties in developing high-quality, low-noise, MIM tunnel junctions. In this work, the authors report Pt-SiO2-Pt MIM SETs with tunnel barriers deposited by e-beam evaporation as an alternative to atomic layer deposition. There are some challenges in the formation of tunnel barriers via e-beam evaporation that are addressed. It is expected that platinum has a negligible native oxide; however, there is a substantial resistance in as-deposited Pt-SiO2-Pt structures that can be reduced by over 5 orders of magnitude by subjecting the finished devices to an anneal in a hydrogen plasma, suggesting the presence of an interfacial platinum oxide. It is shown that this treatment not only increases the conductance through the SET, but that it is necessary for forming high conductance tunnel barriers that are desired for making low-noise SETs.

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