Simultaneous removal of nitrate, hydrogen peroxide and phosphate in semiconductor acidic wastewater by zero-valent iron

Abstract

The zero-valent iron (ZVI) wastewater treatment has been applied to simultaneous removal of nitrate, hydrogen peroxide and phosphate in semiconductor acidic wastewaters. The simultaneous removal occurs by the reactions performed due to the sequential transformation of ZVI under the acidic condition. Fortunately the solution pH of semiconductor acidic wastewaters is low which is effective for the sequential transformation of ZVI. Firstly the reduction of nitrate is taken place by electrons generated by the corrosion of ZVI under acidic conditions. Secondly the ferrous ion generated by the corrosion of ZVI reacts with hydrogen peroxide and generates ·OH radical (Fenton reaction). The Fenton reaction consists of the degradation of hydrogen peroxide and the generation of ferric ion. Finally phosphate precipitates out with iron ions. In the simultaneous removal process, 1.6 mM nitrate, 9.0 mM hydrogen peroxide and 1.0 mM phosphate were completely removed by ZVI within 100, 15 and 15 min, respectively. The synergy among the reactions for the removal of nitrate, hydrogen peroxide and phosphate was found. In the individual pollutant removal experiment, the removal of phosphate by ZVI was limited to 80% after 300 min. Its removal rate was considerably improved in the presence of hydrogen peroxide and the complete removal of phosphate was achieved after 15 min.