Abstract
We established a system for simultaneous measurements of photoelectrochemical (PEC) reaction and photoabsorption in a semiconductor photoelectrode. This system uses a photoacoustic technique and photoelectrodes with a film-thickness gradient that was prepared by electrophoretic deposition of tungsten(VI) oxide particles while pulling up a substrate. The system enabled high-throughput determination of optimum film thickness, and the results showed that irradiation direction has a significant influence on PEC performance for a photoelectrode with a thick film. Furthermore, the mechanism of enhancement of PEC performance by postnecking treatment was discussed.
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