Abstract
Simultaneous aggregation and sedimentation of silica particles in the presence of surfactants has been studied by performing experiments using Kruss tensiometer (K100). Experiments are based on the measurement of cumulative mass versus time, of the settled particles with the help of a highly precise weighing balance. The effects of various factors, such as, surfactant concentration, pH and salts have been studied in detail. The aggregation and sedimentation of silica particles in presence of HTAB surfactant is faster at HTAB concentration of 0.2 cmc and in the pH range of 8–10. The aggregation and sedimentation of silica particles increase in the presence of salts e g., CaCl 2 and NaBr, due to screening of charges on silica particles. However, the presence of both HTAB and CaCl 2 or NaBr has detrimental effect on aggregation and consequently sedimentation rate of silica particles is decreased. These results are explained based on hydrophobic and electrostatic interactions between silica particles and surfactant molecules.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
More From: Colloids and Surfaces A: Physicochemical and Engineering Aspects
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.