Simulation of microwave plasma generator

Abstract

Results of 3D simulation of the waveguide resonator tract together with the gas-discharge chamber were presented. On the basis of simulation the geometric parameters of the microwave generator in the matched mode with the maximum transmission of energy from the source of the microwave power to the region where the plasma generation will be ob-tained is calculated. The calculation was made on the basis of the condition for further combined use of the device with the magnetron sputtering system and it is intended for the activation of inert gas. In this paper, an analysis of the geo-metrical parameters of the plasma generator, taking into account the calculations, the scheme of the system and the principle of operation of the microwave generator plasma were described. Simulated microwave plasma generator has a wide range of applications, in particular, it can be used in solid surface treatment as an independent device, also as as-sisting device with the magnetron puttering system (thin-film coatings deposition, modification of the surface layer or its removal), or as part of the source of high-energy neutrals (very important in treatment of dielectric coatings), or in a microwave plasma lighting devices (general and special purposes). Vacuum-plasma methods – one of the most promising methods of coating deposition. Causes of that are their environmental safety, high purity of technological processes and product quality. It was possible to expand the opportunities of the method due to use of magnetron sputtering systems (MSS) and ion sources which generate directed streams of ions (both inert and chemically active) of working gases ac-celerated to certain energy. This in turn allows us to use them for cleaning of the substrates surface and influence of the ion flow on the coating during its growth to change its structure. Optical coatings are most often thin film dielectric of complex composition in the form of oxides, nitrides, carbides and their combinations, which are applied to the substrate in the reaction gas environment. Activation of gas is especially necessary when the source medium (source) in the form of unreacted metals and semiconductors is used. The best ways to stimulate the synthesis of optical coatings are non-thermal methods – the activation of gas in plasma of an electric discharge, followed by feeding to the substrate surface, its bombardment with gas ions and ultraviolet radiation.Ref. 12, fig. 9.