Abstract

We have demonstrated a novel planar, avalanche photodiode (APD) for use in long-wavelength (0.95–1.65 μm) optical communication systems. The device is a separate absorption and multiplication region APD utilizing p+ guard rings which are concentric with, but not attached to the central diffused p+-n junction region. Since no contact is made to the rings, their potential is allowed to ‘‘float’’ at a value somewhat less than that established by the externally applied voltage. The APD, which is fabricated in a manner identical to simple p-i-n photodiodes, eliminates edge breakdown effects while greatly reducing the electric field at the insulator/semiconductor interface. A 60-μm-diam junction device grown by vapor phase epitaxy is observed to have a primary dark current of <300 pA, and a capacitance of 290 fF at 90% of the breakdown voltage. Uniform gains as high as 11 have been observed.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.