Simple Photochemical Route to Block Copolymers via Two‐Step Sequential Type II Photoinitiation

Abstract

AbstractA simple method for the preparation of block copolymers by a two‐step sequential Type II photoinitiation is described. In the first step, amine functionalized poly(methyl methacrylate) (PMMA‐N(Et)2) is prepared by photopolymerization of methyl methacrylate at λ = 350 nm using benzophenone and triethyl amine as photosensitizer and hydrogen donor, respectively. Subsequent benzophenone‐sensitized photopolymerization of tert‐butyl acrylate using PMMA‐N(Et)2 as hydrogen donor yielded poly(methyl methacrylate)‐block‐poly(tert‐butyl acrylate). The obtained hydrophobic block copolymer is readily converted to amphiphilic polymer by hydrolysis of the tert‐butyl ester moieties of the block copolymer as demonstrated by contact angle measurements. All polymers are characterized by NMR, Fourier transform infrared and UV–vis spectroscopies, and differential scanning calorimetry (DSC) thermal analyses.