Simple model for base pressure effects in source flow chemical lasers

Abstract

A simple model is developed to investigate the effects of base pressure on the performance of source flow chemical lasers. The laser flowfield is divided into two, coupled, 1-D regions representing the pure source flow region and a region influenced by the base pressure. The differential equations describing the gasdynamics, mixing, reaction, and lasing in the two regions are solved using a Runge-Kutta technique. The model indicates that lasing performance decreases as the base pressure increases. However, performance can approach and even exceed that of a pure source flow laser if the base pressure is controlled.