Abstract
A simple method for Fe+ ion production in a microwave ion source has been developed by making use of the plasma chemical reaction of hematite (Fe2O3) powder with a chemically reactive CCl4 discharge plasma. A stable 56Fe+ ion intensity of over 1.3 mA was obtained when the ion source was installed in our 30 keV ion implanter. This was accompanied by an intense chlorine beam (Cl+), but the intensities of oxygen ions (O+,O+2) and carbon ion (C+) were very small despite the fact that these elements (C and O) are major constituents of CCl4 and Fe2O3. Traces of water vapor residue in the ion source enhanced the production of HCl+ ions and suppressed the yield of Fe+ ion production.
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Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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