Simple e-beam air-bridge technology for mm-wave applications

Abstract

► A new and simple air-bridge fabrication technology. ► Simple resist selection gives fewer and simpler fabrication processes. ► No special e-beam dose or process calibration required. ► The process latitude of UVIII resist and polyamide is exploited. ► Excellent experimental demonstration for mm-wave application. We describe a new air-bridge fabrication technology using electron beam lithography. This novel technique greatly simplifies the lithographic process, eliminating the requirement for complex writing control procedures used in established electron-beam lithography based processes. The new technique is demonstrated using single-dose per layer electron beam lithography and is applied to the fabrication of microwave and millimeter-wave waveguide structures.