Abstract
► A new and simple air-bridge fabrication technology. ► Simple resist selection gives fewer and simpler fabrication processes. ► No special e-beam dose or process calibration required. ► The process latitude of UVIII resist and polyamide is exploited. ► Excellent experimental demonstration for mm-wave application. We describe a new air-bridge fabrication technology using electron beam lithography. This novel technique greatly simplifies the lithographic process, eliminating the requirement for complex writing control procedures used in established electron-beam lithography based processes. The new technique is demonstrated using single-dose per layer electron beam lithography and is applied to the fabrication of microwave and millimeter-wave waveguide structures.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
