Abstract
In this letter, we present a novel approach to enhance the breakdown voltage <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex Notation="TeX">$(V_{\rm BD})$</tex></formula> for AlGaN/GaN/AlGaN double-heterostructure FETs (DHFETs), grown by metal–organic chemical vapor deposition on Si (111) substrates through a silicon-substrate-removal and a layer-transfer process. Before removing the Si substrate, both buffer isolation test structures and DHFET devices showed a saturation of <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$V_{\rm BD}$</tex></formula> due to the electrical breakdown through the Si substrate. We observed a <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$V_{\rm BD}$</tex></formula> saturation of 500 V for isolation gaps larger than 6 <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$\mu\hbox{m}$</tex></formula> . After Si removal, we measured a <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$V_{\rm BD}$</tex></formula> enhancement of the AlGaN buffer to 1100 V for buffer isolation structures with an isolation gap of 12 <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex Notation="TeX">$\mu\hbox{m}$</tex></formula> . The DHFET devices with a gate–drain <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX"> $(L_{\rm GD})$</tex></formula> distance of 15 <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$\mu\hbox{m}$</tex></formula> have a <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$V_{\rm BD} > \hbox{1100}\ \hbox{V}$</tex></formula> compared with <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$\sim$</tex></formula> 300 V for devices with Si substrate. Moreover, from Hall measurements, we conclude that the substrate-removal and layer-transfer processes have no impact on the 2-D electron gas channel properties.
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