Silicon Dioxide Coating of Titanium Dioxide Nanoparticles from Dielectric Barrier Discharge in a Gaseous Mixture of Silane and Nitrogen

Abstract

The coating of titanium dioxide nanoparticles with silicon dioxide has been carried out by dielectric barrier discharge (DBD) plasma treatments to enhance the thermostability of Titania for applications at high temperature processes. During the first coating processing step, a closed film of silicon nitride was produced via plasma treatment in a gaseous mixture of silane and nitrogen, while atmospheric surface contaminations got mainly removed. In the second processing step, the DBD plasma treatment in oxygen or air was used to convert the silicon nitride mainly into silicon dioxide. Remaining carbon impurities at the interfaces between titanium dioxide and silicon nitride after the nitrogen/silane plasma treatment were subsequently removed simultaneously. Atomic force microscopy and X-ray photoelectron spectroscopy were employed to study the DBD plasma treatments of the TiO2 nanoparticles.