Abstract
A theoretical model on the film thickness calculation is presented in which the thickness of the metal silicide formed after reaction can be expressed in terms of the densities of metal, silicon, and silicide. Results show that the effective thickness of the formed MoSi2 after reaction as calculated by Fomin et al. must be modified by an invariant factor of 0.83. Experimental data on transition-metal silicides conform to our theoretical model, and values of the modifying factor for various metal silicides are in the range from 0.7 to 0.86. This model is further extended into the more general case in which two silicide phases are formed after the reaction. The silicide phases formed after the reaction can be determined from the diagram showing the total thickness of the silicides formed versus the thickness of the metal consumed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
