Abstract
Several shock-tube experiments were performed to study the oxidation of argon- diluted SiH4/O2 mixtures behind reflected shock waves for temperatures between 1080 and 1780 K at pressures near 1 atm. Reaction progress was monitored using infrared emission from SiH4, FM absorption of SiH2, and chemiluminescence from OH*. Because of the difficulty in making premixed mixtures of silane and oxygen, these experiments produced the first shock- tube data on silane oxidation without the presence of another oxidizing species such as H2. A set of reactions was employed to model the OH* time history, and a reaction involving SiH + O2 was required to reproduce the OH* behavior. When compared to an existing chemical kinetics model of high-temperature silane oxidation, the agreement between data and model for the SiH2 and SiH4 measurements is not good, indicating some improvement in the mechanism is needed.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
