Abstract
The infrared multiphoton dissociation (IRMPD) of SiF 4 in the presence of CH 4 has been studied using a tunable CO 2 TEA laser. The siliconated reaction products have been identified. A kinetic scheme has been proposed to explain the experimental results. The reaction rate constant of the trifluorosilyl radical, SiF 3, with CH 4 has been obtained from the numerical solution of the differential equation system associated to the kinetic mechanism proposed as well as from non-linear regression methods. It has been additionally found that this reaction occurs through two channels. The relative importance of each and their reaction rate constants have been determined as well.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
