Infrared multiphoton dissociation of SiF 4: gas phase reactions of SiF 3 with F and H 2

Abstract

The infrared multiphoton dissociation (IRMPD) of pure SiF 4 and in mixtures with different gases was studied using a tunable CO 2 TEA laser. The initial dissociation step of the IRMPD of SiF 4 was found to be the decomposition into SiF 3 and F. The gas phase reactions of trifluorosilyl, SiF 3, with F and H 2 was investigated. A kinetic scheme was proposed to explain the experimental results. The set of coupled differential equations associated to this scheme was numerically solved. The rate constants of the SiF 3+F→SiF 4 and SiF 3+H 2→SiF 3H+H reactions were determined.