Abstract
Summary form only given. We have designed and constructed a compact duoPIGatron-type ion source, for possible use in ion implanters. In our ion source ions are extracted from side aperture in contrast to conventional duoPIGatron sources with axial ion extraction. The size of the side extraction aperture is 1times40 mm. The ion source was developed to study physical and technological aspects relevant to an industrial ion source. The side extraction duoPIGatron has stable arc, uniformly bright illumination, and dense plasma. Positive characteristics of the ion source are the long life time of the cathode filament, the great values of the discharge current (up to 10 A and more), and ability of the ion source assembly to take a significant thermal load without an appreciable change of geometry of the discharge system. Dissipated power at electrodes of PIGing discharge system has reached 1 kW and more. The present work describes some of preliminary operating parameters of the ion source using argon, BF3. The total unanalyzed beam currents are 23 mA using Ar at an arc current 5 A and 13 mA using BF3 gas at an arc current 6 A.
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