Abstract
An Nd:YAG pulsed laser was employed to irradiate different gas-puff targets. The interaction gives rise to the emission of soft X-ray (SXR), ultraviolet and extreme ultraviolet (EUV) radiation useful for X-ray microscopy. A Silicon Carbide (SiC) and a Si detector were employed to characterize the photon plasma emission of different gases in different wavelength ranges. The EUV and SXR measurements with different filters show the applicability of SiC detectors for plasma monitoring and characterization. Detector linearity, plasma evolution over the time and the relative intensity signal of both detectors will be presented and discussed.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
