Abstract

Abstract Half-wave plate (HWP) is one of the key polarization controlling devices in optical systems. The conventional HWPs based on birefringent crystals are inherently bulky and difficult to be monolithically integrated with other optical components. In this work, metasurface-based HWPs with high compactness are demonstrated on a 12-inch silicon complementary metal-oxide-semiconductor platform. Three-dimensional finite difference time domain simulation is used to design the nanostructure and investigate the impact of fabrication process variation on the device performance. In addition, the cross- and co-polarization transmittance (T cross and T co) of the HWPs located at different wafer locations are characterized experimentally. The peak T cross and valley T co values of 0.69 ± 0.053 and 0.032 ± 0.005 are realized at the wavelength around 1.7 μm, respectively. This corresponds to a polarization conversion efficiency of 95.6% ± 0.8%.

Highlights

  • Waveplates, as one of the most commonly used optical components, have wide applications in optical systems for polarization control

  • The Half-wave plate (HWP) were fabricated on a 12-inch Si (100) wafer using the multiple-projects-wafer process for flat-optics in Institute of Microelectronics (IME), A*STAR

  • The HWPs with diameters of less than 1 inch can be directly patterned within a single die as the die size of the immersion lithography tool is 26 mm × 33 mm

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Summary

Introduction

Waveplates, as one of the most commonly used optical components, have wide applications in optical systems for polarization control. The control of polarization is achieved by using the birefringence of the material through a propagation distance As a result, these components require a material with enough thickness to accumulate the phase difference in different polarizations. With the advances of nanotechnology, the nanostructure pattern resolution is able to achieve a ­sub-wavelength scale in the optical wavelength regime This enables the fabrication of flat optics devices, which consists of metaelements with sub-wavelength dimensions and gaps. The metasurface-based half-wave plates (HWPs) have been demonstrated by using a patterned metallic structure to achieve the designed phase shift and the polarization control [6, 7]. The optical performances of the HWPs at different wafer locations are characterized and analyzed

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