Abstract
Si delta-doped In0.15Ga0.85As/GaAs strained quantum wells are demonstrated by atmospheric pressure metalorganic chemical vapor deposition. The samples were characterized by variable temperature Hall effect, high magnetic field magnetoresistance, quantum Hall effect, capacitance-voltage measurements (C-V), and secondary-ion mass spectroscopy. The C-V profile showed a full width at half maximum as narrow as 15 Å. Two-dimensional electron gas transport was verified by observing step-like structures in the quantum Hall effect in samples containing sheet densities less than 5×1012 cm−2. Sheet densities as high as 1.0×1013 cm−2 were achieved. C and O contamination were not observed during the Si delta-doping process.
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