Abstract
We present a design of a nanometrology measuring setup which is a part of the national standard instrumentation for nanometrology operated by the Czech Metrology Institute (CMI) in Brno, Czech Republic. The system employs a full six-axis interferometric position measurement of the sample holder consisting of six independent interferometers. Here we report on description of alignment issues and accurate adjustment of orthogonality of the measuring axes. Consequently, suppression of cosine errors and reduction of sensitivity to Abbe offset is achieved through full control in all six degrees of freedom. Due to the geometric configuration including a wide basis of the two units measuring in y-direction and the three measuring in z-direction the angle resolution of the whole setup is minimize to tens of nanoradians. Moreover, the servo-control of all six degrees of freedom allows to keep guidance errors below 100 nrad. This small range system is based on a commercial nanopositioning stage driven by piezoelectric transducers with the range (200 × 200 × 10) μm. Thermally compensated miniature interferometric units with fiber-optic light delivery and integrated homodyne detection system were developed especially for this system and serve as sensors for othogonality alignment.
Highlights
Developments in production technology on the micro-scale, precision manufacturing and especially in the electronic semiconductor industry, have increased the demand for precision measurements of dimensional quantities on a scale below and far below one micrometer
The concept of instrumentation for nanometrology resulted into a combination of such a microscopy technique with a measuring system capable to deliver the resolution and precision needed on the nanoscale with traceability to the primary length standard
0.1 nm Design and performance of the system presented here are a part of the effort to establish a national standard for nanometrology
Summary
Developments in production technology on the micro-scale, precision manufacturing and especially in the electronic semiconductor industry, have increased the demand for precision measurements of dimensional quantities on a scale below and far below one micrometer. Measurement far below the wavelength limit together with the need to image and quantify dimensions on the nanoscale generates specific and very complex problems which are the domain of nanometrology, a new discipline of metrology. Dimensional measurement of objects on the nanoscale needs an imaging method with resolution well below the wavelength of visible light or some sort of a scanning sense with dimensions in the same range as the desired resolution. The concept of instrumentation for nanometrology resulted into a combination of such a microscopy technique with a measuring system capable to deliver the resolution and precision needed on the nanoscale with traceability to the primary length standard. For a larger scale system this becomes a challenge in mechanical engineering [4] This contribution deals primarily with the aspects of positioning and associated measurement and control of angle (guidance) errors. The presented principle of adjustment of the orthogonality of the measuring beams together with the feedback control of the guidance errors helps to reduce the cosine errors, and contributes to lower sensitivity to the Abbe offset induced errors
Sign-in/Register to view highlights & summary Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
