Abstract
We demonstrate a new method for high resolution patterning of the facets of a nonlinear crystal, LiB3O5, based on lithographic exposure of its anti-reflection coating layer, followed by ion beam milling. This crystal is attractive for high intensity frequency conversion due to its high damage threshold. We demonstrate an application of our patterning method for shaping the fundamental beam, as well as the second harmonic beam that is generated in the crystal. We fabricated six different phase masks that generated the following beam profiles in both wavelengths: on- and off-axis high order Hermite-Gaussian beam, Airy beam, vortex beam, lens and a periodic Bragg grating. Such an optical device opens up new possibilities for compact beam shaping in high power nonlinear interaction in a broad range of frequencies.
Highlights
Nonlinear frequency conversion in quadratic nonlinear crystals is widely used to generate coherent radiation in wavelengths in which compact and efficient sources are not available
An alternative is the direct functionalization of the facet of the nonlinear crystal. This has been previously demonstrated by adding a metal layer which was patterned by focused ion beam milling, in order to generate a binary amplitude mask [9] or by direct threedimensional printing of phase masks in a polymer that was added to the facet of the crystal [10]. Whereas these two techniques enabled arbitrary shaping of beams that were generated in the nonlinear crystal, they are still limited to low power applications – in the first technique owing to absorption and losses in the metal layer of the amplitude mask, and in the second method owing to the limited damage threshold of the polymer that is used in the printing process
We demonstrate a new method for shaping beams in nonlinear processes, that is suitable for very high-intensity applications
Summary
Nonlinear frequency conversion in quadratic nonlinear crystals is widely used to generate coherent radiation in wavelengths in which compact and efficient sources are not available. This has been previously demonstrated by adding a metal layer which was patterned by focused ion beam milling, in order to generate a binary amplitude mask [9] or by direct threedimensional printing of phase masks in a polymer that was added to the facet of the crystal [10] Whereas these two techniques enabled arbitrary shaping of beams that were generated in the nonlinear crystal, they are still limited to low power applications – in the first technique owing to absorption and losses in the metal layer of the amplitude mask, and in the second method owing to the limited damage threshold of the polymer that is used in the printing process. Such properties are highly desired in high power industrial applications
Sign-in/Register to view highlights & summary Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
