Abstract
Titanium–nickel–platinum (Ti54Ni26Pt20) thin films shape memory alloys are produced using direct current magnetron sputtering process. The films are deposited on a (100) silicon substrate with 500 nm of wet thermal oxide layer. As-deposited amorphous films are crystallized at 550 °C and 600 °C for 1 h. X-ray diffraction shows that the structure of the martensitic phase is orthorhombic (B19). Both films exhibit classic shape memory effect. The transformation temperatures for the films are above 300 °C, the film annealed at 600 °C has higher transformation temperatures which are attributed to the presence of large precipitates not found in the film annealed at 550 °C.
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