Shallow defect states in GaAs responsible for GaAs bandgap upconversion induced by electron beam during MBE growth

Abstract

Upconversion through excitation of bulk GaAs is investigated by change in crystal growth conditions with electron beam (e-beam). The upconverted photoluminescence intensity is enhanced several times by striking the source fluxes with e-beam during molecular beam epitaxy (MBE) growth. Experimental evidence for a shallow intermediate state being responsible for this upconversion is presented. It is suggested that the intermediate state may be formed by shallow exciton trap states induced by As anti-site defects, which can be increased with e-beam during MBE growth.