Abstract
Upconversion through excitation of bulk GaAs is investigated by change in crystal growth conditions with electron beam (e-beam). The upconverted photoluminescence intensity is enhanced several times by striking the source fluxes with e-beam during molecular beam epitaxy (MBE) growth. Experimental evidence for a shallow intermediate state being responsible for this upconversion is presented. It is suggested that the intermediate state may be formed by shallow exciton trap states induced by As anti-site defects, which can be increased with e-beam during MBE growth.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
